发明名称 POWER SYSTEM FOR STERILIZATION SYSTEMS EMPLOYING LOW FREQUENCY PLASMA
摘要 The present invention provides a sterilization system that includes a low frequency power feedback control system for controllably adjusting a power applied to a low frequency plasma within a vacuum chamber of the sterilization system t o remove gas or vapor species from the article. The power has a frequency of from 0 t o approximately 200 kHz. The low frequency power feedback control system includes a power monitor adapted to produce a first signal indicative of the power applied to the low frequency plasma within the vacuum chamber. The low frequency power feedback control system further includes a power control module adapted to produce a second signal in response to the first signal from the power monitor, and a power controller adapted to adjust, in response to the second signal, the power applied to th e low frequency plasma to maintain a substantially stable average power applied to the low frequency plasma while the article is being processed.
申请公布号 CA2357957(C) 申请公布日期 2009.12.01
申请号 CA20012357957 申请日期 2001.10.01
申请人 ETHICON, INC. 发明人 LEMUS, ANTHONY;PLATT, ROBERT C., JR.;CHOPERENA, ALFREDO M.;AGAMOHAMADI, MITCH
分类号 A61L2/14;A61L2/18;A61L2/20;A61L2/24;B01J19/08;H05H1/24 主分类号 A61L2/14
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