发明名称 Voltage-controlled semiconductor device
摘要 SiC-IGBTs, which have an inversion-type channel with high channel resistance and have high on-voltage due to an influence from the surface state of the interface between a gate insulating film and a base layer, are required to decrease the on-voltage. An embedded collector region is partially formed in a base layer which is formed on an emitter layer of a SiC semiconductor. A channel layer is formed on the base layer and the embedded collector region to constitute an accumulation-type channel. Consequently, at on time, holes are accumulated in the upper layer portion of the channel layer so that a low-resistant channel is formed. Current by the holes flows to the emitter layer through a channel from the collector region and becomes a base current for an npn transistor composed of the embedded collector region, the base region and the emitter region.
申请公布号 US7626232(B2) 申请公布日期 2009.12.01
申请号 US20050593878 申请日期 2005.03.17
申请人 THE KANSAI ELECTRIC POWER CO., INC. 发明人 ASANO KATSUNORI;SUGAWARA YOSHITAKA
分类号 H01L29/739;H01L29/94;H01L29/10;H01L29/12;H01L29/24;H01L29/78 主分类号 H01L29/739
代理机构 代理人
主权项
地址