发明名称 |
Voltage-controlled semiconductor device |
摘要 |
SiC-IGBTs, which have an inversion-type channel with high channel resistance and have high on-voltage due to an influence from the surface state of the interface between a gate insulating film and a base layer, are required to decrease the on-voltage. An embedded collector region is partially formed in a base layer which is formed on an emitter layer of a SiC semiconductor. A channel layer is formed on the base layer and the embedded collector region to constitute an accumulation-type channel. Consequently, at on time, holes are accumulated in the upper layer portion of the channel layer so that a low-resistant channel is formed. Current by the holes flows to the emitter layer through a channel from the collector region and becomes a base current for an npn transistor composed of the embedded collector region, the base region and the emitter region. |
申请公布号 |
US7626232(B2) |
申请公布日期 |
2009.12.01 |
申请号 |
US20050593878 |
申请日期 |
2005.03.17 |
申请人 |
THE KANSAI ELECTRIC POWER CO., INC. |
发明人 |
ASANO KATSUNORI;SUGAWARA YOSHITAKA |
分类号 |
H01L29/739;H01L29/94;H01L29/10;H01L29/12;H01L29/24;H01L29/78 |
主分类号 |
H01L29/739 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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