MANUFACTURING METHOD FOR DISPLAY

摘要

PURPOSE: A manufacturing method of a display device for reducing the load of a dry etching process is provided to improve the performance of the device by safely patterning metal layer coated on an oxide semiconductor layer. CONSTITUTION: A gate(102) is formed on a first substrate. A first insulating layer(103) is formed on the gate. An oxide semiconductor layer(104) is formed on the first insulating layer. A first metal layer(105) is formed on the oxide semiconductor layer. A second metal layer(106) is formed on an ohmic contact layer. The second metal layer is etched to a wet type. A source and drain etches the first metal layer.