发明名称 |
LOWER ELECTRODE DESIGN FOR HIGHER UNIFORMITY |
摘要 |
A PLASMA PROCESSING SYSTEM FOR PROCESSING A SUBSTRATE IS DISCLOSED. THE PLASMA PROCESSING SYSTEM INCLUDES A PROCESS CHAMBER (102) WITHIN WHICH A PLASMA (103) IS BOTH IGNITED AND SUSTAINED FOR PROCESSING. THE PLASMA PROCESSING SYSTEM FURTHER INCLUDES AN ELECTRODE (104) DISPOSED AT THE LOWER END OF THE PROCESS CHAMBER (102). THE ELECTRODE IS CONFIGURED FOR GENERATING AN ELECTRIC FIELD INSIDE THE PROCESS CHAMBER . THE PLASMA PROCESSING SYSTEM ALSO INCLUDES A COMPONENT FOR CONTROLLING AN IMPEDANCE BETWEEN THE ELECTRODE (104) AND THE PLASMA (103). THE IMPEDANCE IS ARRANGED TO AFFECT THE ELECTRIC FIELD TO IMPROVE PROCESSING UNIFORMITY ACROSS THE SURFACE OF THE SUBSTRATE (110).
|
申请公布号 |
MY139877(A) |
申请公布日期 |
2009.11.30 |
申请号 |
MYPI20051250 |
申请日期 |
2000.12.29 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
HAO, FANGLI;ELLINGBOE, ALBERT, R.;LENZ, ERIC, H., |
分类号 |
H01L21/306;H05H1/46;C23C16/505;H01J37/32;H01L21/205;H01L21/3065 |
主分类号 |
H01L21/306 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|