| 摘要 |
[PROBLEMS]To accurately control a film forming speed.[MEANS FOR SOLVING PROBLEMS]A deposition apparatus (20) is provided with a deposition source unit (100), a transporting mechanism (200) for transporting an evaporated film forming material; and a blow out mechanism (400) for blowing out the transported film forming material. The deposition source unit (100) is provided with a deposition source assembly (As), a housing (Hu) and a water-cooling jacket (150). In the deposition source assembly (As), a gas supply mechanism (105), a gas introducing section (115) and a first material evaporating chamber (U) are integrally formed. Argon gas is introduced from a plurality of gas channels (105p) formed on the gas supply mechanism (105) to the first material evaporating chamber (U). A heater (120) of the housing (Hu) heats the film forming material in the first material evaporating chamber (U) and a carrier gas flowing in the gas channels (105p). The evaporated film forming material is carried by the argon gas. The water-cooling jacket (150) is arranged at a prescribed distance from the outer circumference surface of the housing (Hu) to cool the deposition source unit (100). |
