| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alkali-developable resin composition having excellent sensitivity, resolution, adhesion and alkali resistance, and the like and forming a minute pattern with high precision, a compound useful as a raw material for the alkali-developable photosensitive resin composition, an alkali-developable resin composition using the compound, and an alkali-developable photosensitive resin composition. <P>SOLUTION: The compound has a structure obtained by crosslinking a compound (X) which has a structure obtained by reacting an unsaturated monobasic acid (B) with a polyfunctional epoxy compound (A), and a compound (Y) which has a structure obtained by reacting an epoxy compound (D) with a polyhydroxy aromatic compounds (C), with a polybasic acid anhydride (E). <P>COPYRIGHT: (C)2010,JPO&INPIT |
