| 摘要 |
A method of forming through-hole vias in a semiconductor wafer involves forming a semiconductor wafer having a plurality of die with contact pads disposed on a surface of each die. The semiconductor wafer has a saw street between each die. A trench is formed in the saw street without using support material to support the semiconductor wafer. The trench extends only partially through the semiconductor wafer. The portion of the saw street below the trench along a backside of the semiconductor wafer has sufficient thickness to maintain structural support for the semiconductor wafer without support material during formation of conductive vias between the die, and electrically connection of the conductive vias to the contact pads. The portion of the saw street below the trench along the backside of the semiconductor wafer is removed. The semiconductor wafer is singulated along the saw street to separate the die.
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