发明名称 |
METHOD FOR MANUFACTURING PATTERN LAYER FORMED BODY WITH HIGH AND LOW LEVELS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a pattern layer formed body with high and low levels by which a pattern layer of various levels including a combination of patterns of various levels can be manufactured simultaneously by using one material by a photo lithographic method. <P>SOLUTION: The method includes steps of: a photosensitive layer forming step of applying a photosetting resin composition on a substrate to form a photosensitive layer; an exposure step for exposing the photosensitive layer through a mask which has a light shielding layer to interrupt transmission of light and an opening formed along the pattern of the pattern layer with various levels and which has a filter absorbing ≥40% of light in the wavelength range of 200 to 500 nm disposed in a part of the opening; and a pattern layer forming step for developing the exposed photosensitive layer to form the pattern layer with various levels in which the photosensitive layer corresponding to the region where the filter is disposed in the opening of the mask gives a part of low level. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2009276774(A) |
申请公布日期 |
2009.11.26 |
申请号 |
JP20090160153 |
申请日期 |
2009.07.06 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
SUMINO TOMONOBU;HAYASHI SHINJI |
分类号 |
G03F7/20;G02F1/1337;G02F1/1339 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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