PROCESS AND APPARATUS FOR REMOVING RESIDUES FROM THE MICROSTRUCTURE OF AN OBJECT

摘要

A process for removing residues from the microstructure of an object is provided, which comprises steps of preparing a remover including CO2 and additive for removing the residues and a co-solvent dissolving the additive in said CO2 at a pressurized fluid condition; and bringing the object into contact with the remover so as to remove the residues from the object. An apparatus for implementing the process is also provided.