发明名称 SPUTTERING TARGET, METHOD FOR PRODUCING THIN FILM AND DISPLAY DEVICE
摘要 <p>When an LaB6 thin film is formed by magnetron sputtering, the single crystallinity of the thus-formed LaB6 thin film in the wide-area domain direction is improved. Specifically, a sputtering target containing a boron atom (B), a lanthanum atom (La) and a carbon atom (C) is used.</p>
申请公布号 WO2009142223(A1) 申请公布日期 2009.11.26
申请号 WO2009JP59242 申请日期 2009.05.20
申请人 CANON ANELVA CORPORATION;KURIBAYASHI MASAKI 发明人 KURIBAYASHI MASAKI
分类号 C23C14/34 主分类号 C23C14/34
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