| 摘要 |
<P>PROBLEM TO BE SOLVED: To smoothly convey an optical member, such as, a projection optical system, in maintenance processing, replacement processing, and the like. <P>SOLUTION: An exposure device has the optical member which forms a predetermined pattern image on a substrate and a structure CL which supports the optical member. The structure has a support portion 41 which supports the optical member at a position higher than the position of the center of gravity of the optical member, with respect to a first direction Z. The support portion extends in a second direction X crossing the first direction to be separated and is arranged on both sides across a space 43, where the optical member is stored with respect to a third direction Y crossing the first direction and second direction, and the space is open at least on one side, with respect to the second direction. <P>COPYRIGHT: (C)2010,JPO&INPIT |
