发明名称 GAS CLEANING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a gas cleaning apparatus of which the maintenance can be easily performed at a working site, of which the treating capacity can be easily adjusted suiting to the scale of the working site and of which the performance can be fully exhibited even at an increased treating capacity. <P>SOLUTION: The gas cleaning apparatus 100 is constituted by stacking in layers, gas inflow units (30, 70) having inflow openings (31, 32, 71, 72) taking in a gas to be treated and gas housing spaces (37, 77) filled with the gas taken in through the inflow openings; cleaning units (20, 40, 60, 80) housing and holding a cleaning agent through which the gas taken into the gas housing space (37, 77) passes; and gas discharge units (10, 50, 90) having the spaces housing the treated gas (17, 57, 97) filled with the treated gas passing through the cleaning agent and gas discharge openings (11, 12, 51, 52, 91, 92) connected to the space housing the treated gas. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2009274024(A) 申请公布日期 2009.11.26
申请号 JP20080128445 申请日期 2008.05.15
申请人 ANYX CO LTD 发明人 KOBAYASHI JUNICHI;SATO TAKASHI
分类号 B01D53/34;B01D53/04;B01D53/38;B01D53/81 主分类号 B01D53/34
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