发明名称 METHOD FOR ROUGHENING SUBSTRATE, PHOTOVOLTAIC DEVICE, AND METHOD FOR MANUFACTURING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To obtain a method for roughening a substrate capable of uniform roughening of the surface of a substrate independent of the material of the substrate, a method for manufacturing a photovoltaic device, and the photovoltaic device. <P>SOLUTION: A method for roughening a substrate and manufacturing a photovoltaic device includes: a first process to form a mask film on the surface of one face side of the substrate; a second process to transcribe concave and convex shapes of a mold onto the mask film by pressing using the mold having concave and convex shapes on the surface; a third process to remove the mask film from the direction almost perpendicular to the in-plane direction of the substrate by dry etching; and a fourth process to perform dry etching to the surface of the substrate from the direction almost perpendicular to the in-plane direction of the substrate, after the removal of the mask film. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2009277979(A) 申请公布日期 2009.11.26
申请号 JP20080129505 申请日期 2008.05.16
申请人 MITSUBISHI ELECTRIC CORP 发明人 NISHIMURA KUNIHIKO
分类号 H01L31/04;H01L21/3065 主分类号 H01L31/04
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