发明名称 |
METHOD FOR PRODUCING CERIUM SALT, CERIUM OXIDE, AND CERIUM-BASED ABRASIVE MATERIAL |
摘要 |
PROBLEM TO BE SOLVED: To reduce scratch developed on a surface to be polished in polishing with a cerium-based abrasive material containing cerium oxide particles, by reducing the amount of impurities contained in cerium salt particles to heighten the purity, in a method for producing a cerium salt which is a raw material for cerium oxide particles. SOLUTION: The method for producing the cerium salt includes: obtaining one or more cerium-containing intermediates from a cerium compound; and adding a precipitant to obtain a cerium salt precipitate, wherein at least one step of separating and removing insoluble components from the cerium-containing intermediates in the solution state is included. COPYRIGHT: (C)2010,JPO&INPIT
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申请公布号 |
JP2009274953(A) |
申请公布日期 |
2009.11.26 |
申请号 |
JP20090194508 |
申请日期 |
2009.08.25 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
KAYANE KANJI;MIYAOKA SEIJI |
分类号 |
C01F17/00;C09G1/02;C09K3/14;H01L21/3105;H01L21/321 |
主分类号 |
C01F17/00 |
代理机构 |
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