发明名称 METHOD FOR PRODUCING CERIUM SALT, CERIUM OXIDE, AND CERIUM-BASED ABRASIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To reduce scratch developed on a surface to be polished in polishing with a cerium-based abrasive material containing cerium oxide particles, by reducing the amount of impurities contained in cerium salt particles to heighten the purity, in a method for producing a cerium salt which is a raw material for cerium oxide particles. SOLUTION: The method for producing the cerium salt includes: obtaining one or more cerium-containing intermediates from a cerium compound; and adding a precipitant to obtain a cerium salt precipitate, wherein at least one step of separating and removing insoluble components from the cerium-containing intermediates in the solution state is included. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009274953(A) 申请公布日期 2009.11.26
申请号 JP20090194508 申请日期 2009.08.25
申请人 HITACHI CHEM CO LTD 发明人 KAYANE KANJI;MIYAOKA SEIJI
分类号 C01F17/00;C09G1/02;C09K3/14;H01L21/3105;H01L21/321 主分类号 C01F17/00
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