发明名称 Electron beam focusing electrode and electron gun using the same
摘要 An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused.
申请公布号 US2009289542(A1) 申请公布日期 2009.11.26
申请号 US20080285671 申请日期 2008.10.10
申请人 SAMSUNG ELECTRONICS CO., LTD. AND SEOUL NATIONAL UNIVERSITY INDUSTRY FOUNDATION. 发明人 BAIK CHAN WOOK;SRIVASTAVA ANURAG;KIM JONG MIN;KIM SUN IL;SON YOUNG MOK;PARK GUN SIK;SO JIN KYU
分类号 H01J29/48;H01J29/46 主分类号 H01J29/48
代理机构 代理人
主权项
地址