发明名称 |
Electron beam focusing electrode and electron gun using the same |
摘要 |
An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused.
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申请公布号 |
US2009289542(A1) |
申请公布日期 |
2009.11.26 |
申请号 |
US20080285671 |
申请日期 |
2008.10.10 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. AND SEOUL NATIONAL UNIVERSITY INDUSTRY FOUNDATION. |
发明人 |
BAIK CHAN WOOK;SRIVASTAVA ANURAG;KIM JONG MIN;KIM SUN IL;SON YOUNG MOK;PARK GUN SIK;SO JIN KYU |
分类号 |
H01J29/48;H01J29/46 |
主分类号 |
H01J29/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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