发明名称 |
PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND METHODS FOR USE |
摘要 |
A method and a composition. The composition includes at least one carbosilane-substituted silsesquioxane polymer which crosslinks in the presence of an acid. The at least one carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The method includes forming a coating on a substrate. The coating includes one or more carbosilane-substituted silsesquioxane polymers. The carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The coating is exposed to radiation, resulting in generating a latent pattern in the coating. The exposed coating is baked at a first temperature less than about 150° C. The baked coating is developed, resulting in forming a latent image from the latent pattern in the baked coating. The latent image is cured at a second temperature less than about 500° C.
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申请公布号 |
US2009291389(A1) |
申请公布日期 |
2009.11.26 |
申请号 |
US20080126287 |
申请日期 |
2008.05.23 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ALLEN ROBERT D.;BROCK PHILLIP JOE;DAVIS BLAKE W.;DUBOIS GERAUD JEAN-MICHEL;LIN QINGHUANG;MILLER ROBERT D.;NELSON ALSHAKIM;PURUSHOTHAMAN SAMPATH;SOORIYAKUMARAN RATNAM |
分类号 |
G03F7/075;C08G77/12;G03F7/20 |
主分类号 |
G03F7/075 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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