| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an arc vapor-deposition apparatus that can effectively inhibit a short circuit across between a cathode and a trigger electrode and can extend a period in which the apparatus can be used in a maintenance-free state to a longer period of time (or increase the number of times of use). <P>SOLUTION: The arc vapor-deposition apparatus 100 has an arc vapor-deposition source 10 including a pressure-reduced vessel 8 that accommodates a cylindrical anode 6 which accommodates one unit body formed of the cathode 1, an insulator 4 surrounding the cathode 1, a C ring 3 provided on the outer perimeter of the insulator 4, and the trigger electrode 2 provided on the outer perimeter of the C ring 3; and also has a first feeding means 9A for moving the cathode 1 relatively against the insulator 4 according to a consumed amount of the vapor-deposition material constituting the cathode 1, and a second feeding means 9B for making at least the insulator 4 protrude from the end of the C ring 3. The gap width of a groove 31 of the C ring 3 becomes gradually wider toward a direction of the cathode 1 from a trigger electrode 2 side. <P>COPYRIGHT: (C)2010,JPO&INPIT |
