发明名称 POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <p>A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including: a first actuator to exert an actuation force on the table, the first actuator being connected to a first balance mass constructed and arranged to absorb a reaction force of the first actuator, wherein the positioning system includes a controller and a second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the first balance mass.</p>
申请公布号 SG156572(A1) 申请公布日期 2009.11.26
申请号 SG20090023359 申请日期 2009.04.03
申请人 ASML NETHERLANDS B.V. 发明人 BUTLER, HANS;CUIJPERS, MARTINUS, AGNES, WILLEM;HOOGENDAM, CHRISTIAAN, ALEXANDER;DE JONGH, ROBERTUS, JOHANNES, MARINUS;RENKENS, MICHAEL, JOZEF, MATHIJS;VAN DER WIJST, MARC, WILHELMUS, MARIA;WIJCKMANS, MAURICE, WILLEM, JOZEF, ETIENNE;TOUSAIN, ROBERTUS, LEONARDUS;FAASSEN, RONALD, PETRUS HENDRICUS;KOEVOETS, ADRIANUS, HENDRIK
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