发明名称 |
MULTI-VARIABLE REGRESSION FOR METROLOGY |
摘要 |
<p>A method for assessing metrology tool accuracy is described. Multi-variable regression is used to define the accuracy of a metrology tool such that the interaction between different measurement parameters is taken into account, A metrology tool under test (MTUT) and a reference metrology tool (RMT) are used to measure a set of test profiles. The MTUT measures the test profiles to generate a MTUT data set for a first measurement parameter. The RMT measures the test profiles to generate RMT data sets for the first measurement parameter, and at least a second measurement parameter. Multi-variable regression is then performed to generate a best-fit plane for the data sets. The coefficient of determination (R2 value) represents the accuracy index of the MTUT.</p> |
申请公布号 |
SG156566(A1) |
申请公布日期 |
2009.11.26 |
申请号 |
SG20090017633 |
申请日期 |
2009.03.16 |
申请人 |
CHARTERED SEMICONDUCTOR MANUFACTURING LTD |
发明人 |
ZHAN ZHOU WEN;ZHENG ZOU;GOH JASPER;SHENG ZHOU MEI |
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