发明名称 PROBE POSITION CORRECTING METHOD AND PROBER
摘要 PROBLEM TO BE SOLVED: To achieve a probe position correcting method which enables more practically suitable correction of positional relation and allows operators to correct positional relation easily. SOLUTION: The probe position correcting method, in which a wafer 100 having multiple electrode pads P and Q formed thereon is shifted relative to multiple probes 11 of a probe card 12 in three axial directions (X, Y and Z) so as to correct positions at which the multiple electrode pads and the multiple probes make contact with each other includes: a step (201) of bringing the multiple electrode pads and the multiple probes into contact with each other; a step (203) of recognizing probe traces by processing their images; a step (204) of computing margins between the probe traces and frames of the multiple electrode pads in four directions (±X directions and±Y directions); a step (205) of computing the minimum margin in each of the four directions; and a step of correcting positions at which the multiple electrode pads and the multiple probes make contact with each other on the basis of the minimum margins in the four directions. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009277871(A) 申请公布日期 2009.11.26
申请号 JP20080127382 申请日期 2008.05.14
申请人 TOKYO SEIMITSU CO LTD 发明人 YAMAMOTO SATOSHI;OZAWA YUICHI;UEDA YUTAKA
分类号 H01L21/66;G01R31/28 主分类号 H01L21/66
代理机构 代理人
主权项
地址