| 摘要 |
PURPOSE: A resist stripper composition is provided to ensure removal capacity of resist residues, dry and wet etching residue strippability, corrosion resistance of wiring containing aluminium or copper, excellent profitability by reducing the used amount of expensive solvent. CONSTITUTION: A resist stripper composition comprises (a) a basic compound, (b) an amide compound represented by chemical formula 1, (c) a polar solvent, (d) a hydroxybenzene compound, and (e) water. In chemical formula 1, R1, R2 and R3 are hydrogen, C1-10 alkyl group, C1-10 hydroxyalkyl group, carboxyl group, C1-10 alkyl group substituted with C1-10 alkoxy group, or an amino group substituted or unsubstituted with C1-4 alkyl group, wherein the R1 and R2 can together form a ring. |
