发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
摘要 <p>Disclosed is a semiconductor device including a field effect transistor comprising a diffusion layer and a resistance change element comprising a variable resistor layer. The semiconductor device comprises the variable resistor layer provided on the diffusion layer, a via provided on the variable resistor layer, and a wiring layer connected to the via.</p>
申请公布号 WO2009142165(A1) 申请公布日期 2009.11.26
申请号 WO2009JP59113 申请日期 2009.05.18
申请人 NEC CORPORATION;SUNAMURA, HIROSHI;ITO, KIMIHIKO 发明人 SUNAMURA, HIROSHI;ITO, KIMIHIKO
分类号 H01L27/10;H01L21/28;H01L21/768;H01L23/522;H01L29/78;H01L45/00;H01L49/00 主分类号 H01L27/10
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