发明名称 EXPOSURE DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To easily perform predetermined processings on an exposure device. <P>SOLUTION: The exposure device has a mask stage device ST for holding a mask and a lighting device IL2 for lighting up a mask. Furthermore, the exposure device includes an elevation device LT for integrally elevating and lowering the mask stage device and lighting device. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009277678(A) 申请公布日期 2009.11.26
申请号 JP20080124517 申请日期 2008.05.12
申请人 NIKON CORP 发明人 EGASHIRA HIROYUKI;YOTSUMOTO HIROAKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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