| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a composition for nanoimprint excellent in adhesiveness to a substrate, peel property of a mould, and etching resistance. <P>SOLUTION: The composition for nanoimprint is characterized by including a resin having a repeating unit (a) having a polycyclic aromatic structure represented by a general formula (1). Wherein, R<SP>1</SP>represents a hydrogen atom, an alkyl group which may be substituted, or a halogen atom; X represents a single bond or an organic linking group; and L represents a polycyclic aromatic group which may have a substituent group. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
