发明名称 CONDUCTIVE FILM STRUCTURE, ITS MANUFACTURING METHOD, AND CONDUCTIVE FILM TYPE INTEGRATED CIRCUIT PROBE DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a conductive film structure, its manufacturing method and a conductive film type integrated circuit probe device. <P>SOLUTION: The manufacturing method of the conductive film structure includes a step providing a flexible insulation substrate, a step of forming a conductive film on the flexible insulation substrate, a step of forming a plurality of fine conductive wires which are parallel each other in a long axis direction by patterning the conductive film on the flexible insulation substrate, a step of forming an insulation layer on the flexible insulation substrate and the fine conductive wire, and a step of forming a conductive block which is made by rolling or folding the flexible insulation substrate on the long axis direction center of the fine conductive wire. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2009276346(A) 申请公布日期 2009.11.26
申请号 JP20090109127 申请日期 2009.04.28
申请人 IND TECHNOL RES INST 发明人 SHU BINKETSU;GO TOKEN;TSAI JEN-HUI;RIN KOI
分类号 G01R1/073;G01R1/067;H01L21/66 主分类号 G01R1/073
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