发明名称 |
Inspecting Method and Inspecting Apparatus for Substrate Surface |
摘要 |
To inspect a substrate such as a semiconductor substrate for surface roughness at high precision. The surface roughness of the substrate is measured in each frequency band of the surface roughness by applying a light to the substrate surface and detecting a scattered light or reflected light at a plurality of azimuth or elevation angles.
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申请公布号 |
US2009290168(A1) |
申请公布日期 |
2009.11.26 |
申请号 |
US20090470505 |
申请日期 |
2009.05.22 |
申请人 |
HAMAMATSU AKIRA;OSHIMA YOSHIMASA;MAEDA SHUNJI;SHIBUYA HISAE;URANO YUTA;NAKAO TOSHIUKI;MARUYAMA SHIGENOBU |
发明人 |
HAMAMATSU AKIRA;OSHIMA YOSHIMASA;MAEDA SHUNJI;SHIBUYA HISAE;URANO YUTA;NAKAO TOSHIUKI;MARUYAMA SHIGENOBU |
分类号 |
G01B11/30;G01B11/06 |
主分类号 |
G01B11/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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