发明名称 SUBSTRATE TRAY AND FILM FORMING APPARATUS
摘要 A substrate tray which holds a substrate and is arranged to oppose a thin film material source is characterized by including a holding member which holds the substrate and is provided with an opening through which thin film material particles emitted from the thin film material source to be deposited on the substrate pass, a first mask which is arranged between the holding member and the substrate and shields the thin film material particles passing through the opening not to deposit on the substrate, to form a thin film having a predetermined shape on the substrate, and a second mask which is arranged between the holding member and the first mask and covers the first mask at least partly to shield the thin film material particles not to deposit on the first mask.
申请公布号 US2009291203(A1) 申请公布日期 2009.11.26
申请号 US20070307782 申请日期 2007.07.04
申请人 CANON ANELVA CORPORATION 发明人 HAGI SEIJI;HATAYAMA SEIJI;NISHIO KAZUTOSHI
分类号 B05D5/12;B05C13/02 主分类号 B05D5/12
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