发明名称 |
A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN COMPRISING A LACTEM |
摘要 |
The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where R1 is independently selected hydrogen, C1-C4 alkyl, C1-C-6 alkyl alcohol, hydroxy (OH), amine (NH2), carboxylic acid, and amide (CONH2), represents the attachment to the polymer, m=1-6, and n=1-4. The present invention also relates to a process for manufacturing a microelectronic device.
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申请公布号 |
WO2008122884(A8) |
申请公布日期 |
2009.11.26 |
申请号 |
WO2008IB00908 |
申请日期 |
2008.04.09 |
申请人 |
AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
THIYAGARAJAN, MUTHIAH;DAMMEL, RALPH, R.;CAO, YI;HONG, SUNGEUN;KANG, WENBING;ANYADIEGWU, CLEMENT |
分类号 |
C09D139/00;G03F7/039 |
主分类号 |
C09D139/00 |
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