发明名称 PHOTOSENSITIVE PLATE FOR PEEL-APART PRINTING
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive plate for peel-apart printing which improves the poor sharpness of a printed image by a peel-apart printing method and smudging of an image pattern having a line width of less than 15 &mu;m. <P>SOLUTION: A peel-apart printing plate for an image forming method including a first step of applying ink to the whole surface of a peel-apart printing plate, having an image area provided with an ink-repellent function (A) and a non-image area provided with an ink-attracting function; a second step of transferring the ink on the image area of the peel-apart printing plate onto a blanket provided with an ink-repellent function (B) by pressing the blanket on the plate; and a third step of transferring the ink on an image area of the blanket onto a substrate, is the photosensitive plate for peel-apart printing comprising a base layer, having a surface which provides an ink-attracting function and a photosensitive resist patterned on the base layer, which provides an ink-repellent function. The photosensitive resist includes a silicone-based resin and a photopolymerization initiator. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009276598(A) 申请公布日期 2009.11.26
申请号 JP20080128253 申请日期 2008.05.15
申请人 HITACHI CHEM CO LTD 发明人 INOUE KEISUKE;SAWABE MASARU;YOSHIDA TAKESHI
分类号 G02B5/20;B41C1/10;B41M1/08;B41M1/34;B41M3/00;B41N1/14;G03F7/00;G03F7/075 主分类号 G02B5/20
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