| 发明名称 |
METHOD AND APPARATUS FOR OVERLAY COMPENSATION BETWEEN SUBSEQUENTLY PATTERNED LAYERS ON WORKPIECE |
| 摘要 |
Methods and apparatuses for patterning workpieces are provided. The methods and apparatuses described herein improve overlay between subsequently patterned layers on a workpiece by introducing an improved alignment method that compensates for workpiece distortions. |
| 申请公布号 |
WO2009141720(A1) |
申请公布日期 |
2009.11.26 |
| 申请号 |
WO2009IB05685 |
申请日期 |
2009.05.22 |
| 申请人 |
MICRONIC LASER SYSTEMS AB;FREDRIK, SJOSTROM;WAHLSTEN, MIKAEL |
发明人 |
FREDRIK, SJOSTROM;WAHLSTEN, MIKAEL |
| 分类号 |
G01B11/30;B41J2/435;G01B11/25;G03F7/20 |
主分类号 |
G01B11/30 |
| 代理机构 |
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