发明名称 |
DIELECTRIC FILM, DIELECTRIC ELEMENT, AND PROCESS FOR PRODUCING THE DIELECTRIC ELEMENT |
摘要 |
<p>Disclosed is a dielectric film formed by attaching a single layer or a multilayer of a niobic acid nano sheet. Also disclosed is a dielectric element that can simultaneously realize a high permittivity and good insulating properties even in a nano region. The dielectric element comprises a dielectric film and other electrode disposed on the surface of the dielectric film. Further disclosed is a process for producing the dielectric element that can sweep away problems of a deterioration in a substrate interface by heat annealing in the production process, a deviation in composition from a contemplated composition caused by the deterioration in the substrate interface, and electrical mismatching, and an essential problem of a "size effect" that a reduction in the thickness of the film to a nano level lowers the specific permittivity and increases a leak current; can utilize unique properties and high texture and structure regulating properties possessed by the niobic acid nano sheet; and can produce the element at a low temperature free from the influence of a deterioration in substrate interface and a deviation in composition from a contemplated composition.</p> |
申请公布号 |
WO2009142325(A1) |
申请公布日期 |
2009.11.26 |
申请号 |
WO2009JP59550 |
申请日期 |
2009.05.25 |
申请人 |
NATIONAL INSTITUTE FOR MATERIALS SCIENCE;OSADA MINORU;SASAKI TAKAYOSHI |
发明人 |
OSADA MINORU;SASAKI TAKAYOSHI |
分类号 |
C01G33/00;H01G4/10;H01G4/33;H01L21/316;H01L21/8242;H01L27/108;H01L29/78 |
主分类号 |
C01G33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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