发明名称 DIELECTRIC FILM, DIELECTRIC ELEMENT, AND PROCESS FOR PRODUCING THE DIELECTRIC ELEMENT
摘要 <p>Disclosed is a dielectric film formed by attaching a single layer or a multilayer of a niobic acid nano sheet.  Also disclosed is a dielectric element that can simultaneously realize a high permittivity and good insulating properties even in a nano region.  The dielectric element comprises a dielectric film and other electrode disposed on the surface of the dielectric film.  Further disclosed is a process for producing the dielectric element that can sweep away problems of a deterioration in a substrate interface by heat annealing in the production process, a deviation in composition from a contemplated composition caused by the deterioration in the substrate interface, and electrical mismatching, and an essential problem of a "size effect" that a reduction in the thickness of the film to a nano level lowers the specific permittivity and increases a leak current; can utilize unique properties and high texture and structure regulating properties possessed by the niobic acid nano sheet; and can produce the element at a low temperature free from the influence of a deterioration in substrate interface and a deviation in composition from a contemplated composition.</p>
申请公布号 WO2009142325(A1) 申请公布日期 2009.11.26
申请号 WO2009JP59550 申请日期 2009.05.25
申请人 NATIONAL INSTITUTE FOR MATERIALS SCIENCE;OSADA MINORU;SASAKI TAKAYOSHI 发明人 OSADA MINORU;SASAKI TAKAYOSHI
分类号 C01G33/00;H01G4/10;H01G4/33;H01L21/316;H01L21/8242;H01L27/108;H01L29/78 主分类号 C01G33/00
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