发明名称 REDUCING PARTICLE IMPLANTATION
摘要 Methods disclosed herein include: (a) forming a channel in a sample, the channel extending one micron or more along a direction oriented at an angle to a surface of the sample; (b) exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sample; and (c) forming an image of the sample based on particles that leave the surface.
申请公布号 WO2009114230(A3) 申请公布日期 2009.11.26
申请号 WO2009US34002 申请日期 2009.02.13
申请人 CARL ZEISS SMT, INC.;KNIPPELMEYER, RAINER;ECONOMOU, NICHOLAS;ANANTH, MOHAN;STERN, LEWIS A.;DINATALE, BILL;SCIPIONI, LAWRENCE;NOTTE IV, JOHN V. 发明人 KNIPPELMEYER, RAINER;ECONOMOU, NICHOLAS;ANANTH, MOHAN;STERN, LEWIS A.;DINATALE, BILL;SCIPIONI, LAWRENCE;NOTTE IV, JOHN V.
分类号 G01N23/225 主分类号 G01N23/225
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