发明名称 Optical surface's contamination removing method for extreme ultraviolet lithography, involves removing contaminations from optical surfaces to form polymerized protective layer, which protects optical surface against metallic compounds
摘要 <p>The method involves producing residual gas atmosphere (9) in a vacuum environment (2), where the residual gas atmosphere contains activated hydrogen (10) and a monomer of hydrocarbon (18) i.e. methyl methacrylate. Contaminations (8) are removed from optical surfaces (7a) using the activated hydrogen by simultaneous application of the monomers at the optical surfaces for forming a polymerized protective layer (19), which protects the optical surfaces against metallic compounds (16) produced by the activated hydrogen in the residual gas atmosphere. An independent claim is also included for an optical arrangement comprising an optical element with a cover layer made of transition metal i.e. ruthenium.</p>
申请公布号 DE102009001488(A1) 申请公布日期 2009.11.26
申请号 DE20091001488 申请日期 2009.03.11
申请人 ASML NETHERLANDS B.V.;CARL ZEISS SMT AG 发明人 STORM, ARNOLDUS JAN;EHM, DIRK HEINRICH;MOORS, JOHANNES HUBERTUS JOSEPHINA;WOLSCHRIJN, BASTIAAN THEODOOR;JANSEN, RIK;SLIGTE, EDWIN TE;MIRVAIS, YOUSEFI;STORTELDER, JETSKE;SCHMIDT, STEFAN
分类号 G03F7/20;B08B7/00 主分类号 G03F7/20
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