发明名称 MASK FOR FINE HOLE PATTERN
摘要 <p>PURPOSE: A mask for a fine hole pattern is provided to prevent the leakage of a light supplied from a neighboring micro hole pattern by turning a micro hole pattern of a polygon around a mask substrate. CONSTITUTION: A micro hole pattern mask(100) comprises a mask substrate, a light-shielding layer, and a light-shield pattern. The light-shielding layer(120) is formed on the top of the mask substrate(110), and the hole pattern(120a) of polygon is formed at the light-shielding layer. The hole pattern is designed to form a hole on a wafer and is an octagon of which an edge is removed as a linear shape and or a curve shape. The mask substrate in which the hole pattern is formed is exposed to the top. The light-shield pattern is formed on the top of the exposed mask substrate.</p>
申请公布号 KR20090121531(A) 申请公布日期 2009.11.26
申请号 KR20080047482 申请日期 2008.05.22
申请人 DONGBU HITEK CO., LTD. 发明人 KIM, JONG DOO;KIM, YOUNG MI
分类号 G03F1/54;H01L21/027 主分类号 G03F1/54
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