发明名称 POLISHING LIQUID FOR METAL AND METHOD OF POLISHING FILM TO BE POLISHED
摘要 A polishing liquid for metals which comprises: a metal oxide solubilizer, a metal corrosion inhibitor, a polyacrylic acid polymer, a metal-oxidizing agent, and water. The metal-oxidizing agent is hydrogen peroxide, and the content of hydrogen peroxide is 12-30 mass% based on the polishing liquid for metals. With the polishing liquid for metals, a surface can be polished so as to realize excellent flatness while maintaining a satisfactory polishing speed. Also provided is a method of polishing a film to be polished which comprises using the polishing liquid.
申请公布号 KR20090122182(A) 申请公布日期 2009.11.26
申请号 KR20097014240 申请日期 2008.02.29
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 TOBITA AYAKO;ANZAI SOU;NARITA TAKENORI;NOBE SHIGERU
分类号 C09K3/14;C23F1/18;H01L21/304 主分类号 C09K3/14
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