发明名称 SUBSTRATE PROCESSING SYSTEM
摘要 PURPOSE: A substrate processing system is provided to efficiently return a substrate and improve a throughput of processing a substrate. CONSTITUTION: A substrate processing system includes the following steps. A plurality of processing devices for performing a predetermined process on a substrate is laminated in a vertical direction. Moreover, the processing devices are serially arranged in a horizontal direction. A return area for returning a substrate to the processing devices at a location facing the processing devices is formed along with the vertical and horizontal directions of the processing devices. A plurality of returning arms(92) independently and freely moves in vertical and horizontal directions.
申请公布号 KR20090120397(A) 申请公布日期 2009.11.24
申请号 KR20090023828 申请日期 2009.03.20
申请人 TOKYO ELECTRON LIMITED 发明人 UEDA ISSEI;ITO KAZUHIKO
分类号 H01L21/68 主分类号 H01L21/68
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