发明名称 Pattern matching apparatus and semiconductor inspection system using the same
摘要 Solving means is configured of a signal input interface, a data calculation unit, and a signal output interface. The signal input interface allows image data which is obtained by photographing hole patterns, and CAD data which corresponds to hole patterns included in the image data, to be inputted. The data calculation unit includes: CAD hole-pattern central-position detection means which detects central positions respectively of hole patterns included in the CAD data from the CAD data, and which generates data which represents, with an image, the central positions of the respective hole patterns; pattern extraction means which extracts pattern data from the image data; image hole-pattern central-position detection means which detects central positions of the respective hole patterns in the image data from the pattern data, and which generates data which represents, with an image, the central positions of these hole patterns detected from the image data; and collation process means which detects positional data in the image data corresponding to that in the CAD data through a process of collating the CAD hole-pattern central-position data with the image hole-pattern central-position data. The signal output interface outputs the positional data outputted from the data calculation unit.
申请公布号 US2007098248(A1) 申请公布日期 2007.05.03
申请号 US20060588418 申请日期 2006.10.27
申请人 TOYODA YASUTAKA;SUTANI TAKUMICHI;MATSUOKA RYOICHI 发明人 TOYODA YASUTAKA;SUTANI TAKUMICHI;MATSUOKA RYOICHI
分类号 G06K9/00 主分类号 G06K9/00
代理机构 代理人
主权项
地址