INTERFERENTIAL METHOD OF MEASUREMENT OF SURFACE MICRORELIEF ALTITUDE

摘要

FIELD: measurement technology. ^ SUBSTANCE: this method is based on the use of coherent electromagnetic radiation. Under this technology optical nonlinearity of the surface with microrelief and reference specimen are created. Measurement of the surface microrelief is made by the analysis of the interferences obtained as a result of interaction between nonlinear optical surface reflected from the microrelief of the giant second harmonic and giant second harmonic reflected from the surface of the reference specimen. Unambiguity of the microrelief altitude measurement is ensured by the analysis of the interferences of the derived part of radiation and radiation reflected from the surface with microrelief. Optical nonlinearity of the surfaces with microrelief and reference specimen can be created by the method of chemical chemical etching of the surfaces or by their covering with metal nanoparticles or semiconductor particles. ^ EFFECT: improvement of the accuracy and unambiguity of the measurements of the microrelief altitude with sharp drop of altitudes. ^ 3 cl, 2 dwg