发明名称 SHOWER PLATE, AND PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD USING THE SHOWER PLATE
摘要 Provided is a shower plate in which there's no need for a cover plate. The shower plate 105 is disposed in a processing chamber 102 of a plasma processing apparatus, for discharging a plasma excitation gas to generate plasma in the processing chamber 102, and the shower plate 105 includes a horizontal hole 111 for introducing the plasma excitation gas into the shower plate 105 from a gas inlet port 110 of the plasma processing apparatus; and a vertical hole 112 communicating with the horizontal hole 111, wherein the shower plate 105 is formed as a single body.
申请公布号 US2009286405(A1) 申请公布日期 2009.11.19
申请号 US20070304289 申请日期 2007.06.13
申请人 TOKYO ELECTRON LIMITED;NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY 发明人 OKESAKU MASAHIRO;GOTO TETSUYA;OHMI TADAHIRO;ISHIBASHI KIYOTAKA
分类号 H01L21/3065;B01J19/08;C23C16/00;H01L21/30 主分类号 H01L21/3065
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