发明名称 |
SHOWER PLATE, AND PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD USING THE SHOWER PLATE |
摘要 |
Provided is a shower plate in which there's no need for a cover plate. The shower plate 105 is disposed in a processing chamber 102 of a plasma processing apparatus, for discharging a plasma excitation gas to generate plasma in the processing chamber 102, and the shower plate 105 includes a horizontal hole 111 for introducing the plasma excitation gas into the shower plate 105 from a gas inlet port 110 of the plasma processing apparatus; and a vertical hole 112 communicating with the horizontal hole 111, wherein the shower plate 105 is formed as a single body. |
申请公布号 |
US2009286405(A1) |
申请公布日期 |
2009.11.19 |
申请号 |
US20070304289 |
申请日期 |
2007.06.13 |
申请人 |
TOKYO ELECTRON LIMITED;NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY |
发明人 |
OKESAKU MASAHIRO;GOTO TETSUYA;OHMI TADAHIRO;ISHIBASHI KIYOTAKA |
分类号 |
H01L21/3065;B01J19/08;C23C16/00;H01L21/30 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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