| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface treatment method which can form a homogeneous film having reduced gas release on the whole faces of the surfaces of vacuum vessels such as the vacuum vessel of a vacuum apparatus and parts in each vacuum vessel, and to provide vacuum vessels. Ž<P>SOLUTION: A silicon compound comprising at least one kind of element selected from nitrogen and oxygen, hydrogen and carbon is used as the raw material. The raw material is introduced into a treatment vessel whose pressure is reduced to 10<SP>-3</SP>to 10<SP>-5</SP>Pa in a gaseous state, and plasma by the raw material is generated, so as to deposit a film comprising silicon, hydrogen, carbon and at least one element selected from oxygen and nitrogen on the surfaces of the vacuum treatment vessels to be treated stored in the decompressed treatment vessel. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
|
