发明名称 |
INSPECTION APPARATUS FOR LITHOGRAPHY |
摘要 |
The invention relates to detecting targets located within patterns. The invention operates in the pupil plane by filtering the fourier transform from the surrounding pattern. In particular the method includes performing a fourier transform on reflected radiation data to form fourier transform data; removing portions of the fourier transform data which correspond to the target to form reduced fourier transform data; interpolating the portions of the reduced fourier transform data which were removed, to form product fourier transform data; and subtracting the product fourier transform data from the fourier transform data. |
申请公布号 |
WO2009138162(A1) |
申请公布日期 |
2009.11.19 |
申请号 |
WO2009EP03051 |
申请日期 |
2009.04.27 |
申请人 |
ASML NETHERLANDS B.V.;VAN DE KERKHOF, MARCUS, ADRIANUS |
发明人 |
VAN DE KERKHOF, MARCUS, ADRIANUS |
分类号 |
G03F7/20;G01N21/21;G01N21/27 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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