发明名称 |
LIQUID MATERIAL CURING METHOD AND LIQUID MATERIAL CURING DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid material curing method by which a liquid material applied on a fine region on a substrate is cured for a short time at a low cost without giving distortion to the substrate. Ž<P>SOLUTION: A defect correcting method is carried out by applying correcting ink 5 on a white defect 3, irradiating the applied correcting ink 5 with ultraviolet ray and infrared ray at the same time to cure the correcting ink 5 by the irradiation with the ultraviolet ray and to remove a solvent component in the correcting ink 5 by the irradiation of the infrared ray. The correcting tact time is shortened compared to a conventional one in which the irradiation with the ultraviolet ray and the irradiation with the infrared ray are separately carried out. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2009268983(A) |
申请公布日期 |
2009.11.19 |
申请号 |
JP20080122267 |
申请日期 |
2008.05.08 |
申请人 |
NTN CORP |
发明人 |
YAMANAKA AKIHIRO;SHIMIZU SHIGEO;TANAKA KYUGEN |
分类号 |
B05D3/06;B05C9/12;B05D3/02 |
主分类号 |
B05D3/06 |
代理机构 |
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地址 |
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