PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

摘要

A plasma processing method and a plasma processing apparatus are provided to reduce a manufacturing cost by shortening a manufacturing process time. A plasma processing receptacle(101) include an antenna electrode(102) and a lower electrode(109). A gas supply unit supplies a processing gas to the plasma processing receptacle. An exhaust pump(116) exhausts the processing gas from the plasma processing receptacle through an exhaust valve(115). RF power is applied through a matching unit(105) to the antenna electrode in order to form magnetic field by using a magnetic coil(107) and to generate plasma within the plasma processing receptacle. A sample(108) loaded on the lower electrode is processed by using the plasma. An end of seasoning is determined when a parameter including pressure within the plasma processing receptacle in a plasma processing state approaches a steady value.