发明名称 |
COATING APPARATUS AND METHOD |
摘要 |
A coating apparatus includes a liquid film forming mechanism configured to form a liquid film of a process liquid for preventing a contaminant derived from a coating liquid from being deposited or left on a back side peripheral portion of a substrate. The liquid film forming mechanism includes a counter face portion facing the back side peripheral portion of the substrate and a process liquid supply portion for supplying the process liquid onto the counter face portion. The coating apparatus further includes a posture regulating mechanism disposed around the substrate holding member and configured to damp a vertical wobble of the peripheral portion of the substrate being rotated. The posture regulating mechanism includes delivery holes arrayed in a rotational direction of the substrate and configured to deliver a gas onto a back side region of the substrate on an inner side of the peripheral portion.
|
申请公布号 |
US2009285991(A1) |
申请公布日期 |
2009.11.19 |
申请号 |
US20090390752 |
申请日期 |
2009.02.23 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KITANO TAKAHIRO;OBATA KOICHI;INADA HIROICHI;OGATA NOBUHIRO |
分类号 |
B05D3/12;B05C11/08;B05C13/00 |
主分类号 |
B05D3/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|