| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system and a method suitable for reducing line end shortening. <P>SOLUTION: One embodiment of the invention provides a system and a method for reducing line end shortening during an optical lithography process for manufacturing an integrated circuit. The system operates by receiving a specification of the integrated circuit, wherein the specification defines transistors that includes gates. Next, the system identifies a gate within the specification, wherein the gate includes an end cap that is susceptible to line end shortening during the optical lithography process. The system then extends a phase shifter used to form the gate, so that the phase shifter defines at least a portion of the end cap and thereby reduces line end shortening of the end cap due to optical effects. <P>COPYRIGHT: (C)2010,JPO&INPIT |
