| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a discharge device which has a strong effect. <P>SOLUTION: An electrode 2 of a dielectric barrier wherein dielectric is coated is provided in a chamber 1, in which a discharge is generated. Specifically, the electrode 2 of the dielectric barrier has a metal electrode 23, a dielectric barrier 24, etc., and the metal electrode 23 is coated with the dielectric barrier 24 to generate a discharge from the dielectric barrier 24. The electrode of the dielectric barrier is provided in the chamber 1 and the discharge is generated in the chamber 1, so the efficiency of the discharge of input electric power (electric power applied to the electrode) is good and electric power is saved. Consequently, the discharge device (a plasma processing device in this embodiment) which is inexpensive and has the strong effect is provided. <P>COPYRIGHT: (C)2010,JPO&INPIT |
