| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative photosensitive resin composition which is excellent in resolution, insulation, flatness, chemical resistance and adhesive force and exhibits superior sensitivity, film retention and UV transmittance particularly in the formation of organic insulating films of a high-aperture-ratio liquid crystal display and a reflective liquid crystal display as compared with conventional photosensitive resins, whereby it is suitable for use as organic insulating films. <P>SOLUTION: The negative photosensitive resin composition comprises (a) an acrylic copolymer obtained by copolymerizing (i) an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride or a mixture of these, (ii) an epoxy group-containing unsaturated compound, and (iii) an olefinic unsaturated compound, (b) a photoinitiator comprising 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazoyl-3-yl]-1-(O-acetyloxime), (c) a polyfunctional monomer having an ethylenically unsaturated bond, (d) a silicon-based compound having an epoxy group or an amine group, and (e) a solvent. <P>COPYRIGHT: (C)2010,JPO&INPIT |
