LIQUID IMMERSION LITHOGRAPHIC DEVICE, DRYING DEVICE, LIQUID IMMERSION METRO LOGY DEVICE AND METHOD FOR MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To disclose a liquid immersion lithographic device for immersing a substrate in a lithography projection device in a liquid having a relatively high refractive index such as water so as to fill a space between the final element of a projection system and the substrate.

SOLUTION: In the liquid immersion lithographic device, a liquid removing device is configured so as to remove the liquid from the substrate through a plurality of slender slots disposed along a line and also having an angle to the line, for example during exposure. The liquid removing device can act as a meniscus-fixed fixing device in a liquid immersion hood or used in a drying device for removing a liquid droplet from the substrate.

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