发明名称 FLUID HANDLING STRUCTURE, LITHOGRAPHY DEVICE, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To disclose a fluid handling structure where the size and structure of a fluid extraction opening are designated to reduce vibration transmitted to the fluid handling structure as a result of two-phase extraction. <P>SOLUTION: The area of respective fluid extraction openings, the total area of all of the fluid extraction openings, and/or the space between adjacent fluid extraction openings can be controlled. When vibration decreases, precision in exposure is improved. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009272640(A) 申请公布日期 2009.11.19
申请号 JP20090113348 申请日期 2009.05.08
申请人 ASML NETHERLANDS BV 发明人 DIREKS DANIEL JOSEPH MARIA;DANNY MARIA HUBERTUS PHILIPS;CLEMENS JOHANNES GERARDUS VAN DEN DUNGEN;STEFFENS KOEN;VAN PUTTEN ARNOLD JAN;MAIKEL ADRIANUS CORNELIS SCHEPERS;BERKVENS PAUL PETRUS JOANNES
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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