发明名称 Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system
摘要 An illumination optical system is one for illuminating a surface to be illuminated with light from a light source, which has a distribution forming optical system including an optical integrator and forming a pupil intensity distribution on an illumination pupil located behind the optical integrator, and an optical attenuator arranged on a predetermined surface in an optical path behind the optical integrator and having an attenuation characteristic of varying an attenuation rate depending upon an angle of incidence to the predetermined surface.
申请公布号 US2009284727(A1) 申请公布日期 2009.11.19
申请号 US20090366429 申请日期 2009.02.05
申请人 NIKON CORPORATION 发明人 MURAMATSU KOUJI;TANITSU OSAMU;TANAKA HIROHISA;YAMAMOTO MASAYA;MIYAKE NORIO;MIZUNO YASUSHI;TAKAYA RYUJI;YOSHIMOTO RISA;HIROTA HIROYUKI
分类号 G03B27/54;G03B27/72 主分类号 G03B27/54
代理机构 代理人
主权项
地址