发明名称 |
Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system |
摘要 |
An illumination optical system is one for illuminating a surface to be illuminated with light from a light source, which has a distribution forming optical system including an optical integrator and forming a pupil intensity distribution on an illumination pupil located behind the optical integrator, and an optical attenuator arranged on a predetermined surface in an optical path behind the optical integrator and having an attenuation characteristic of varying an attenuation rate depending upon an angle of incidence to the predetermined surface.
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申请公布号 |
US2009284727(A1) |
申请公布日期 |
2009.11.19 |
申请号 |
US20090366429 |
申请日期 |
2009.02.05 |
申请人 |
NIKON CORPORATION |
发明人 |
MURAMATSU KOUJI;TANITSU OSAMU;TANAKA HIROHISA;YAMAMOTO MASAYA;MIYAKE NORIO;MIZUNO YASUSHI;TAKAYA RYUJI;YOSHIMOTO RISA;HIROTA HIROYUKI |
分类号 |
G03B27/54;G03B27/72 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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